How TSMC managed to increase efficiency of ASML's EUV tools: System-level optimizations and in-house pellicles —chipmaker boosted EUV-driven wafer production by 30x over six years while reducing power consumption by 24%

Date: 2025-09-17 13:10:06

TSMC has dramatically boosted EUV scanner throughput, pellicle performance, and energy efficiency through deep in-house innovations.