Russia outlines EUV litho chipmaking tool roadmap through 2037 — country eyes replacing DUV with EUV

Date: 2025-09-27 17:12:25

The Russian Academy of Sciences has unveiled a 2026–2037 roadmap for domestic 11.2 nm EUV lithography tools that reject ASML's architecture in favor of xenon plasma, Ru/Be mirrors, and solid-state lasers, aiming for simplified, tin-free, cost-effective alternatives.